MG Chemicals 418-500ML Positive Photo Resist Developer (16 Oz)

MG Chemicals

Item# 418-500ML

Hazardous Material: Ships Ground only.

Positive Photo Resist Developer (16 Oz)

For removing exposed resist during the positive photofabrication process.

  • Disolves exposed photoresist
  • Concentrated formulation - dilute one part developer to ten parts water
  • For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
  • Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .


More Information
ManufacturerMG Chemicals
Mfg No.418-500ML
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