Item# 418-500ML
Hazardous Material: Ships Ground only.
Positive Photo Resist Developer (16 Oz)
For removing exposed resist during the positive photofabrication process.
- Disolves exposed photoresist
- Concentrated formulation - dilute one part developer to ten parts water
- For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
- Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .
California Restricted | No |
---|---|
Hazmat | Yes |
Manufacturer | Discontinued Products |
Mfg No. | 418-500ML |
Type | Photo Developer |