MG Chemicals 418-500ML Positive Photo Resist Developer (16 Oz)

$18.99
Out of stock
SKU
MG-418-500ML

Item# 418-500ML

Hazardous Material: Ships Ground only.

Positive Photo Resist Developer (16 Oz)

For removing exposed resist during the positive photofabrication process.

  • Disolves exposed photoresist
  • Concentrated formulation - dilute one part developer to ten parts water
  • For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
  • Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .

 

More Information
California RestrictedNo
HazmatYes
ManufacturerDiscontinued Products
Mfg No.418-500ML
TypePhoto Developer

 

Warning: Cancer and Reproductive Harm
www.P65Warnings.ca.gov